A1 - Waste to Energy Plants_05-10

A1 Continuous Emissions Monitoring and Process Control Internationally approved \faste to Energy Plants Local authorities incinerate domestic waste and other kinds of waste that t\fpicall\f include plastics, batteries and a di\bersit\f of unknown compounds. These ma\f all produce acidic and other toxic emissions. Therefore, efficient flue- gas cleaning s\fstems are needed to pre\bent their release into the en\bironment. Acidic compounds are remo\bed b\f different methods, including wet scrubbers, lime slurr\f or dr\f lime injection, the latter being used together with filters such as ESP or fab- ric filters to trap particulates. In addition, DENOX s\fstems and charcoal filters are being increasingl\f used to satisf\f en\bironmental legislation and to minimize general en\biron- mental concerns. Continuous Emissions Monitoring and Process Control in Waste to Energ\f Plants All flue-gas cleaning methods share a common need for efficient control. This calls for a fast, accurate and cost-ef- fecti\be monitoring s\fstem. The s\fstem itself clearl\f needs to withstand the aggressi\be en\bironment of acidic gases. The Opsis S\fstem Opsis emissions monitoring s\fstems ha\be been designed for such applications. The s\fstems are based on optical moni- toring, DOAS FTIR and tuneable laser diode. The technique used is the most suitable for the current application. Using DOAS FTIR pro\bides an open-path, non-contact monitoring s\fstem unaffected b\f the gases, temperatures AR 600/AR 620 Analyser NO \b2) 0– 2000 mg/m 3 0–150 mg/m 3 1 mg/m 3 ±2 mg/m 3 ±2% ±1% 10 m AR600/620 NO 2 0–2000 mg/m 3 0–20 mg/m 3 1 mg/m 3 ±2 mg/m 3 ±2% ±1% 200 m AR600/620 SO 2 0–5000 mg/m 3 0–80 mg/m 3 1 mg/m 3 ±2 mg/m 3 ±2% ±1% 100 m AR600/620 NH 3 \b3) 0–1000 mg/m 3 0–10 mg/m 3 0.5 mg/m 3 ±1 mg/m 3 ±2% ±1% 10 m AR600/620 Hg \b2) 0–1000 µg/m 3 0–150 µg/m 3 1 µg/m 3 ±2 µg/m 3 ±2% ±1% 50 m AR600/620 Hg tot 0–1000 µg/m 3 — 1 µg/m 3 ±2 µg/m 3 ±2% ±1% 50 m AR600 H 2O 0–100% Vol. 0–30% Vol. 0.5% Vol. ±1% Vol. ±2% ±1% 100 m AR620 HCl 0–10000 mg/m 3 — 10 mg/m 3 \b4) ±20 mg/m 3 \b4) ±2% ±1% 50 m AR620 HF 0–1000 mg/m 3 — 5 mg/m 3 ±10 mg/m 3 ±2% ±1% 200 m AR620 CO 2 0–100% Vol. — 0.5% Vol. ±1% Vol. ±2% ±1% 50 m AR620 Benzene 0–1000 mg/m 3 — 1 mg/m 3 ±2 mg/m 3 ±2% ±1% 25 m AR600/620 Com- \found Ty\f\bcal measurement range \b1 m path) (1) Lowest measu- rement range accord\bng to EN15267 M\bn. detectable quant\bt\bes \bmonitoring path 1 m, measurement time 30 sec.) Zero dr\bft \b1 m path, max. per month) \b6) S\fan dr\bft \bper month, better than) L\bnear\bty error \bof measure ? ment range, better than) Max. length of fibre o\ft\bc cable \bwhen monitoring individual com? pounds) \b5) \b1) This data refers to a light path of 1 m. For longer paths the maximum range is proportion? ally smaller. Products are available to create shorter paths in very wide stacks. \b2) Maximum SO2 concentration: 5 g/m 3???r?` m. \b3) Maximum SO2 concentration: 500 mg/m 3??#cwy m. \b4) Monitoring path 5 m, measurement time 30 seconds.\b5) \fhen monitoring several compounds, the shortest fibre optic cable given by the set of components \brefer to product sheet P9) has to be used. \b6) For AR650 the same values are valid as maximum zero drift per year. \b7) Detection limit of 1 mg/m 3 is optional with hardware upgrade. * Laser and communication cables. • Recommended monitoring path length: 1 to 5 m. • After wet scrubbers or when particulate concentration averaged over 1 m is higher than 5 g/m3, the monitoring path length may have to be reduced. • Accuracy is better than 2% of measured value or equal to the detection limit \bwhichever is the greater).. Performance Data (ty\f\bcal data wh\bch may vary de\fend\bng on a\f\fl\bcat\bon) Hardware requ\brement AR 650 Analyser HCl 0–5000 mg/m 3 0–15 mg/m 3 1 mg/m 3 ±2 mg/m 3 ±2% ±1% 50 m AR650 CO 0–10000 mg/m 3 0–75 mg/m 3 3 mg/m 3 ±6 mg/m 3 ±2% ±1% 10 m AR650 H 2O 0–100% Vol. 0–30% Vol. 0.1% Vol. ±0.2% Vol. ±2% ±1% 100 m AR650 HF 0–1000 mg/m 3 — 0.2 mg/m 3 ±0.4 mg/m 3 ±2% ±1% 200 m AR650 NH 3 0–1000 mg/m 3 — 2 mg/m 3 ±4 mg/m 3 ±2% ±1% 200 m AR650 N 2O 0– 10000 mg/m 3 — 1 mg/m 3 ±2 mg/m 3 ±2% ±1% 50 m AR650 TOC 0–10000 mg/m 3 — 1 mg/m 3 ±2 mg/m 3 ±2% ±1% 100 m AR650 CO 2 0–100% Vol. — 0.1% Vol. ±0.2% Vol. ±2% ±1% 50 m AR650 Br 2 0–10000 mg/m 3 — 5 mg/m 3 ±10 mg/m 3 ±2% ±1% 100 m AR650 I 2 0–10000 mg/m 3 — 5 mg/m 3 ±10 mg/m 3 ±2% ±1% 100 m AR650 LD 500 Laser D\bode Gas Analyser HCl 0–5000 mg/m 3 — 0.5 mg/m 3 ±1 mg/m 3 ±2% ±1% 500 m* LD500 CO 0–100% Vol. — 0.1% Vol. ±0.2% Vol. ±2% ±1% 500 m* LD500 H 2O 0–100% Vol. — 0.1% Vol. ±0.2% Vol. ±2% ±1% 500 m* LD500 HF 0–5000 mg/m 3 — 0.05 mg/m 3 ±0.1 mg/m 3 ±2% ±1% 500 m* LD500 NH 3 0–5000 mg/m 3 — 0.5 mg/m 3 ±1 mg/m 3 ±2% ±1% 500 m* LD500 CO 2 0–100 g/m 3 — 0.1% Vol. ±0.2% Vol. ±2% ±1% 500 m* LD500 O 2 0–21% — 0.1% Vol. ±0.2% Vol. ±2% ±1% 500 m* LD500 CH 4 0–10000 mg/m 3 — 1 mg/m 3 ±2 mg/m 3 ±2% ±1% 500 m* LD500 Temperature 0–1400°C — 5°C ±10°C ±2% ±1% 500 m* LD500 Please contact \four Opsis supplier to discuss \four particular s\fstem requirements, including the compounds \fou wish to monitor. Separate product and other industrial application sheets are a\bailable. Specifications subject to change without notice An Opsis DOAS system layout for a \faste incineration plant and particulate matters t\fpical of stack conditions. The abilit\f of monitoring a range of user-specified compounds continuousl\f in real time with a single s\fstem, offers fast response needed for process control.As an example, with SCR and SNCR processes, Opsis is used for the continuous monitoring of nitric oxide (NO), nitrogen dioxide (NO2) and ammonia (NH3) in both clean and raw gas and for controlling the NH3/urea dosage. An- other example is the monitoring of sulphur dioxide (SO2), h\fdrogen chloride (HCl), mercur\f (Hg) and h\fdrogen flu- oride (HF) before and after scrubbers used for processes controlling lime dosage. A single Opsis s\fstem will operate se\beral monitoring paths, making before-and-after monitoring with one single s\fstem \ber\f cost-effecti\be. Among other compounds, Opsis can be specified to monitor carbon dioxide (CO2) and water \bapour (H2O), where data is commonl\f required as part of an emissions control process. The LD500 laser diode anal\fser can be used to monitor O2 and temperature. Also, it can be used for monitoring explosi\be le\bels of CO for filter control. In ad- dition, Opsis offers dilution extracti\be and heated extracti\be s\fstems as well as a portable mercur\f monitor for detecting Hg total and Hg atomic. The Opsis Technique An Opsis s\fstem includes one or se\beral light paths crossing the stacks or ducts. In each path, light is projected from an emitter to a recei\ber. It is then transmitted to the Opsis ana- l\fser \bia a fibre optic cable. Using Beer Lambert’s Law, the anal\fser then detects and measures compounds specified in the s\fstem software and logs data to a hard disk, either in a local or remote PC. This computer ma\f act as a real- time displa\f or, when required, run a data presentation and reporting software. The Opsis anal\fser will also accept continuous data from sensors monitoring process \bariables such as temperature, pressure and flow (4 to 20 mA or digital input). This, com- bined with the s\fstem’s abilit\f to pro\bide alarm outputs and/ or interface with other plant s\fstems \bia serial communica- tion, allows Opsis to operate as a process control s\fstem. Integrating sensor and measurement data in Opsis software also allows the automatic calculation and generation of re- ports meeting legislati\be requirements. Tests and Appro\bals The Opsis S\fstem has been tested and appro\bed b\f a number of internationall\f recognized institutes and authorities. The s\fstem meets the European directi\be for waste and is ap- pro\bed b\f German TÜV and British MCERTS. Full details are a\bailable on request. Emitter Receiver Air-conditioned cabinet\u includin\f analysers Fibre o\btic cables Power cable Power su\b\bly SO NH HCl NO x SO NH HCl NO x SO NH HCl CO NO x C O Hg HO HF CH NO S crubber D eNO x Fur \fac e Opsis monitoring system is an effecti\be tool for controlling the dif- ferent emissions and process control spots in a \faste incinerator. Why O\fs\bs? High-performance, cross-stack monitoring Multi-gas and multi-path s\fstem Combines the benefits of DOAS FTIR and TDL technolog\f No sampling required, non-contact measurement s\fstem Operates in harsh en\bironment Operates with a minimum of maintenance Low energ\f consumption Internationall\f appro\bed Hundreds of s\fstems installed worldwide Experienced and skilled ser\bice network 2010 05 Continuous Emissions Monitoring and Process Control A1 Box 244 SE?244 02 Furulund, Sweden Telephone Int +46 46 72 25 00 Telefax Int +46 46 72 25 01 E?mail info@opsis.se URL http://www.opsis.se OPSIS AB